Diffusion / Deposition
The Diffusion Furnace with 5-stack platform is designed for high volume solar manufacturing and dedicated for POCl3, BBr3, and Anneal / Oxidation processes. The advanced system set-up handles high wafer loads while ensuring stable, reproducible and versatile process conditions at the lowest cost of ownership. The compact design includes low-loss heating elements and environmentally friendly recirculating air cooling, resulting in more than 25[%] energy savings. The system comes with integrated full automation.
Processes : POCl3 / BBr3 / Anneal / Oxidation / LPCVD Poly
Key system features
- 5 independent tubes
- Pre-installed process recipes for up to 140 Ω/sq sheet resistance with good within-wafer uniformity
- Integrated solution using Tempress’ small pitch back-to-back full automation
- 5-stack system with height < 3,20 m
- Proven in full production
Customer benefits
- Plug and play solution, similar to industry standard atmospheric POCl3
- Fast process qualification, allowing steep production ramp-up
- Very low maintenance cost due to reliable atmospheric process
- Maximum uptime and lowest cost of ownership together with excellent service and support ensures long term successful production capacity