We have a batch-type PECVD system for AIOx, SiOx and SiNx deposition on silicon solar cells. Its propriety heating and boat design allow for 10[%] higher throughput than competitiors systems, while maintaining good colour uniformity.

Key system features

• High throughput >200 MW / system
• The system allows for better color uniformity than achieved on conventional direct plasma PECVD systems. This is achieved by using our uniquely designed boat
• In situ AlOx + SiNx solution available for PERC cell processing
• Tempress’ PID solution has proven to pass even the most stringent PID tests without any cell efficiency penalty
• Graded layers for efficiency enhancement
• Up to 210 mm wafer size
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Customer benefits

• Superior passivation at the surface and in the bulk of the cell, due to the exposure to the direct plasma
• Our PID-free solution enables production of high efficiency cells that are proven to be resistant to PID
• The confinement of the plasma to the substrates and boat ensures only negligible chamber cleaning and maximum productivity of the equipment